advances in resist technology and processing xii (santa clara ca, 20-22 february 1995)allen, robert d.SPIE proceedings series. 1995, isbn 0-8194-1786-6, 2 vol.(XIII, 904 p.), isbn 0-8194-1786-6Conference Proceedings

Advances in resist materials and processing technology XXVII (22-24 February 2010, San Jose, California, United States)Allen, Robert D; Somervell, Mark Howell.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 2 vol, 2, isbn 978-0-8194-8053-8 0-8194-8053-3Conference Proceedings

Advances in resist materials and processing technology XXVIII (28 February-2 March 2011, San Jose, California, United States)Allen, Robert D; Somervell, Mark Howell.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 2 vol, 2, isbn 978-0-8194-8531-1Conference Proceedings

Materials Challenges for sub-20nm lithographyTHACKERAY, James W.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797204.1-797204.16, 2Conference Paper

The Evolution of Patterning Process Models in Computational LithographySTURTEVANT, John L.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763902.1-763902.13, 2Conference Paper

Meso-scale simulation of the line-edge structure based on resist polymer molecules by negative-tone processMORITA, Hiroshi.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720W.1-79720W.7, 2Conference Paper

Identification of spliced gammaherpesvirus 68 LANA and v-cyclin transcripts and analysis of their expression in vivo during latent infectionALLEN, Robert D; DICKERSON, Shelley; SPECK, Samuel H et al.Journal of virology. 2006, Vol 80, Num 4, pp 2055-2062, issn 0022-538X, 8 p.Article

A Study of an Acid Induced Defect on Chemically Amplified Photoresist Applied to Sub-30nm NAND Flash MemoryLIM, Yong-Hyun; EOM, Jae-Doo; JUNG, Woo-Yung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722W.1-79722W.6, 2Conference Paper

Coefficient of Thermal Expansion (CTE) in EUV Lithography: LER and Adhesion ImprovementHIGGINS, Craig; SETTENS, Charles; WOLFE, Patricia et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797211.1-797211.12, 2Conference Paper

Defect printability analysis in negative tone development lithographyHEO, Junggun; OH, Changil; LEE, Junghyung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721K.1-79721K.7, 2Conference Paper

Development of an Inorganic Nanoparticle Photoresist for EUV, E-beam and 193 nm LithographyKRYSAK, Marie; TRIKERIOTIS, Markos; SCHWARTZ, Evan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721C.1-79721C.6, 2Conference Paper

Development of hard mask resist materials in nanoimprint lithographyTAKEI, Satoshi; OGAWA, Tsuyoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722C.1-79722C.8, 2Conference Paper

Development of plant-based resist materials in electron beam lithographyTAKEI, Satoshi; OSHIMA, Akihiro; YANAMORI, Naomi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797229.1-797229.6, 2Conference Paper

Extending Photo-Patternable Low-κ Concept to 193 nm Lithography and E-beam LithographyQINGHUANG LIN; NELSON, A; SHOBHA, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721A.1-79721A.12, 2Conference Paper

Physical Modeling of Developable BARC at KrFREILLY, Michael; BIAFORE, John; CAMERON, James F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720Z.1-79720Z.10, 2Conference Paper

Polymer Bound Photobase Generators and Photoacid Generators for Pitch Division LithographyYOUNJIN CHO; XINYU GU; BLACKWELL, James M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797221.1-797221.8, 2Conference Paper

Resist dispense system for further defect reductionYAMAMOTO, Yusuke; NISHI, Kouzo; TAKAYANAGI, Koji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797230.1-797230.8, 2Conference Paper

Sensitive Polysulfone Based Chain Scissioning Resists for 193 nm LithographyYONG KENG GOH; LAN CHEN; DORGELO, Anneke et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722E.1-79722E.8, 2Conference Paper

Defect performance of a 2X node resist with a revolutionary point-of-use filterBRAGGIN, J; RAMIREZ, R; WU, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391E.1-76391E.8, 2Conference Paper

Development of EUV resists based on various new materialsOIZUMI, Hiroaki; MATSUMARO, Kazuyuki; SANTILLAN, Julius et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390R.1-76390R.8, 2Conference Paper

Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron BeamNATSUDA, Kenichiro; KOZAWA, Takahiro; OKAMOTO, Kazumasa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391K.1-76391K.9, 2Conference Paper

New self-assembly strategies for next generation lithographySCHWARTZ, Evan L; BOSWORTH, Joan K; PAIK, Marvin Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390G.1-76390G.11, 2Conference Paper

Orthogonal lithography for organic electronicsTAYLOR, Priscilla G; LEE, Jin-Kyun; ZAKHIDOV, Alexander A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390Z.1-76390Z.8, 2Conference Paper

Study on approaches for improvement of EUV-resist sensitivityTARUTANI, Shinji; TSUBAKI, Hideaki; TAKAHASHI, Hidenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763909.1-763909.8, 2Conference Paper

The Imaging Study of a Novel Photopolymer Used in I-line Negative-tone resistLIU LU; ZOU YINGQUAN.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391B.1-76391B.6, 2Conference Paper